"REACHING TRENDS IN PLASMA PROCESSING SCIENCE" |
RACORD |
|
Research contract no.: CEEX-05-D11-13
Project coordinator: National Institute for Laser, Plasma and Radiation Physics
Project manager: Dr. Gheorghe Dinescu, CS I, e-mail: dinescug@infim.ro
Institutions involved in the project:
1. National Institute for Lasers, Plasma and Radiation Physics (NILPRP)
Low Temperature Plasma Laboratory
Plasma Processes for Funtional Materials and Surfaces
Dr. Gheorghe Dinescu, CS I, e-mail: dinescug@infim.ro
2. Research - Development National Institute for Physics of Materials (NIPM)
Defects of Microstructures in Solid Materials
Dr. Leona Nistor, CS I, e-mail: leonis@infim.ro
3. Research - Development National Institute for Optic Electronics (INOE 2000)
Advanced Surface Processing and Analysis by Vacuum Technologies
Dr. Viorel Braic, e-mail: vbraic@inoe.inoe.ro
4. Horia Hulubei National Institute of Physics and Nuclear Engineering (IFIN-HH)
Department of Nuclear Physics
Dr. Nicolae Victor Zamfir, e-mail: dirgen@ifin.nipne.ro
5. Faculty of Physics - University of Bucharest (FF-UB)
The Department of Atomic and Nuclear Physics
Re. Bercu Mircea, e-mail: mbercu@olimp.unibuc.ro
Department of Mechanics, Molecular Physics and Physics of Polymers
Re. Dr. Emil Stefan Barna, e-mail: emil.barna@unibuc.ro
6. Petroleum - Gas University of Ploiesti (GUP)
Faculty of Physics
Re. Dr. Fiz. Grigore Ruxanda, e-mail: gruxanda@upg-ploiesti.ro
Faculty of Petroleum and Petrochemistry
Faculty of Chemistry
Dr. Dragos Ciupariu, e-mail: dciuparu@mail.upg-ploiesti.ro
7. C. ZECASIN s.a.
Dr. Ruxandra Birjega, e-mail: ruxandra.birjega@inflpr.ro
General objectives of the project
1. Elaboration of new plasma systems for material processing (atmospheric pressure, combined):
a) realization and demonstration of a plasma system based on atmospheric discharge for deposition / cleaning of surfaces;
b) assessment of the synergistic effect of combined plasma techniques at atmospheric pressure (laser plasma an RF palsma) in deposition of improved quality thin films ant etching.
2. Functionalization of surfaces / deposition of thin polymeric films requied for adhesivity control and selective interaction:
a) to promote selective chemical interactions;
b) controlled adherence.
3. Plasma stimulated growth of nanostructured materials on catalytic nano-porous templates and powder production and treatment in plasma:
a) develop a process and explain whether Plasma Enchanced CVD is beneficial for growth (rate, nanostrctured properties) as compared with CVD only;
b) develop an assess plasma systems for powder production / powder functionalization.
4. Plasma process for stimuli / responsive filtration system based on polymeric nuclear track membranes:
a) imagine and assess the effectiveness of a plasma solution for modifying porous materials, like track membranes, inside channels with small dimension, even in the sub-micrometric range .
Persons involved in the project:
Senior scientist
PhD students
Youth under 35 years
CS1 or equivalent
CS2 or equivalent
CS3 or equivalent
CS or equivalent
Unascertained persons |
12
9
17
10
5
5
10
19 |
|